Abstract
Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic understanding of the processes at play, at which point hands on experience was acquired on the ALD system present in Parag Banerjee’s lab. The following paper simply reflects the knowledge gained throughout this process as well as where that knowledge will be applied in future endeavors.
Document Type
Final Report
Class Name
Mechanical Engineering and Material Sciences Independent Study
Date of Submission
5-16-2017
Recommended Citation
Pannock, Daniel and Banerjee, Parag, "Atomic Layer Deposition" (2017). Mechanical Engineering and Materials Science Independent Study. 40.
https://openscholarship.wustl.edu/mems500/40